The reason why the Netherlands can build lithography: technology accumulation, western countries technology **** enjoy and support, chip companies' financial support and market support.
1, technology accumulation
The Netherlands asml is separated from Philips, and Philips itself is very strong technical strength, so asml in the establishment of the time also inherited a lot of key technologies of Philips, which is an important foundation for its development.
2, the western countries technology **** enjoy and support
The reason why the Netherlands can have the core technology of high-end lithography, inseparable from the technical support of a number of countries in the West. For example, the current asml light source equipment is provided by the U.S. companies, in addition to the ASML lens is provided by the German Zeiss, these companies in their own field is the world's top level.
In addition, including South Korea's Samsung, Hynix, etc. will share some of the technology with ASML, so in a number of countries under the technical **** with the support of the Netherlands ASML can be so strong development.
3, the chip company's financial support and market support
Asml is able to break out from the three-legged and realize the exclusive monopoly, there is a very important reason is that the chip company's financial support and market support. For example, we are familiar with some of the chip giants Intel, MediaTek, TSMC, Samsung, Hynix are all shareholders of Asml, these chip giants constantly provide financial support to Asml.
Besides, because they are shareholders of ASML, these chip giants will prioritize the use of ASML's equipment when purchasing photolithography machines, which is also one of the important reasons why ASML can grow and develop.
Performance indicators
The main performance indicators of the lithography machine are: the range of supported substrate sizes, resolution, alignment accuracy, exposure mode, light source wavelength, light intensity uniformity, and production efficiency.
Resolution is a way of describing the accuracy of the finest lines achievable by photolithography processing. The resolution of photolithography is limited by the diffraction of the light source, so with the light source, lithography system, photoresist and process and other aspects of the limitations.
Alignment accuracy is the positioning accuracy of the interlayer pattern during multilayer exposure. Exposure method is divided into contact proximity type, projection type and direct writing type. Exposure light source wavelength is divided into ultraviolet, deep ultraviolet and extreme ultraviolet region, the light source has a mercury lamp, excimer laser and so on.