1, technology accumulation
The Dutch asml was separated from Philips, and the technical strength of Philips itself is very strong, so asml also inherited many key technologies from Philips when it was established, which is an important foundation for its development.
2. Western countries enjoy and support technology.
The Netherlands can have the core technology of high-end mask aligner, which can not be separated from the technical support of some western countries. For example, at present, the light source equipment of asml is provided by American enterprises, and the lens of ASML is provided by Zeiss of Germany. These enterprises are the top level in the world in their own fields.
In addition, Samsung and Hynix, including South Korea, will also share some technologies with asml, so with the support of technologies from many countries, ASML in the Netherlands can grow and develop like this.
3. Financial support and market support of chip enterprises.
One of the important reasons why Asml can break through from the three pillars and achieve exclusive monopoly is the financial support and market support of chip companies. For example, some chip giants that we are familiar with at present, such as Intel, MediaTek, TSMC, Samsung and Hynix, are all shareholders of asml, and these chip giants continuously provide financial support to asml.
Besides, because they are shareholders of asml, these chip giants will give priority to Asml equipment when purchasing from mask aligner, which is one of the important reasons why ASML can grow and develop.
Mask aligner's performance index.
The main performance indexes of mask aligner are: supporting the size range of the substrate, resolution, alignment accuracy, exposure mode, light source wavelength, light intensity uniformity, production efficiency, etc.
Resolution is a description of the precision of the thinnest line that can be achieved by photolithography. The resolution of lithography is limited by the diffraction of light source, so it is limited by light source, lithography system, photoresist and process.
Alignment accuracy is the positioning accuracy of interlayer patterns during multilayer exposure. Exposure methods are divided into contact proximity, projection and direct writing. The wavelength of exposure light sources is divided into ultraviolet, deep ultraviolet and extreme ultraviolet regions, and the light sources include mercury lamps and excimer lasers.