Before, the vice president of SMIC answered this question in an audio program in Himalaya, saying that the mask aligner technology of 1nm is not a technically insurmountable threshold. It's just that it's still difficult to achieve 1nm technology by using projection or immersion technology at present, but in fact, there is direct writing technology in the world that can achieve 1nm, but the silicon wafer using direct writing technology has no commercial value and can only be used to make mask plates, so 3nm is not the limit, so where is the limit of mask aligner? Then look down.
Mask aligner's Limit
In fact, the mask aligner limit is approaching, because the limit of silicon is around 1 nm. If you want to surpass 1nm, you have to change the material. But there is nothing more suitable than silicon in the materials that have been found on the earth, so it will be difficult to surpass 1nm process in the last ten years unless scientists can find a new material. Of course, this kind of material.
It is difficult to surpass 1nm, so how about reaching 1nm? At present, if we want to reach 1nm, at present, when the internal line width of the chip is as narrow as 3nm, and the spacing between copper wires used for conduction in the circuit is too small, a short circuit will occur, so it is difficult to reach 1nm, and we can only hope for the breakthrough of quantum technology.
The Present Situation of Dutch ASML (ASML) Company
In terms of EUV mask aligner, the Dutch company ASML (ASML) monopolized the current EUV mask aligner, and shipped 26 sets last year, setting a new record. It is reported that ASML is developing a new generation of EUV mask aligner, which is expected to start shipping in 2022.
According to the previous report of ASML, it is estimated that 35 EUV mask aligner will be delivered in 2020, and the delivery volume will reach 45-50 by 20021year, which is about twice that of 20 19. At present, the main products shipped by ASML in mask aligner are NXE:3400B and improved NXE:3400C, which have the same basic structure, but NXE:3400C adopts modular design, which is more convenient for maintenance, and the average maintenance time will be shortened from 48 hours to 8- 10 hour, supporting 7nm and 5nm.
The Limit of Dutch ASML (ASML) Company
Compared with the previous mask aligner, the resolution of ASML's new generation mask aligner will be improved by about 70%, which can further improve the accuracy of mask aligner. After all, ASML's previous goal was to aim at the 2nm or even extreme 1nm process. However, the new generation of EUV mask aligner is still a little early, and it will not be shipped until at least 2022, and the large-scale shipment will not be until 2024 or even 2025. At that time, TSMC, Samsung and other companies can consider the process technology below 3nm, so the accuracy of mask aligner is expected to reach 3nm in 2022, and it is estimated that it will be 2030 if it is to reach 1nm.
summary
To sum up, 1nm should be the limit of mask aligner accuracy. It is estimated that it will take about 10 years to achieve this goal. I am a small entropy. What do you think? Leave a message in the comment area below! Welcome to pay attention and continue to answer your questions.
In the ultraviolet spectrum. Different materials have differences.